In the rapidly evolving semiconductor industry, maximizing the efficiency of physical failure analysis (PFA) workflows has become critically important. However, with the shrinking device size and increasing transistor complexity, this task has become more challenging than ever before. Additionally, previous nanoprobing solutions and defect localization techniques are not sufficiently accurate to meet the precision needs of <14 nm probing. Simply put, more precise defect localization is needed.
Fortunately, there is a solution to your physical failure analysis challenges: Introducing the latest nanoprobing workflows, powered by the Thermo Scientific Helios 5 PFIB's delayering and the Thermo Scientific nProber IV System's precision nanoprobing. Proven at the 5 nm node, the nProber IV System provides high-accuracy defect localization and characterization to increase failure analysis success rates. These cutting-edge advancements are set to significantly increase physical failure analysis success rates on the most advanced logic nodes.
In our on-demand webinar, John Sanders, Product Manager, Thermo Fisher Scientific, delves into the world of nProber IV System workflows. Gain valuable insights into how these workflows have become an essential element of advanced failure analysis and discover how they can enhance your own physical failure analysis processes.
After watching this webinar, you’ll be ready to unlock the potential of nanoprobing and maximize the efficiency of your physical failure analysis workflows.