As technology continues to miniaturize, the demand for nanoscale devices and structures is ever increasing. The challenge of converting the latest ideas and designs into valuable assets only continues to grow, and significant technical and financial barriers need to be overcome for successful prototyping of nanoscale devices.
Standard nanofabrication batch processes involve the combined use of different machines for each pattern layer. These instruments might include a spin coater for resist application, a lithography tool, wet chemistry for resist development, a plasma cleaner, and deposition or etching equipment for pattern transfer. The use of so many distinct tools results in a costly and time-consuming prototyping process. As researchers push nanotechnology towards smaller dimensions, these established procedures and recipes often no longer keep pace with the demands of rapid development.